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AlN on Sapphire Substrate

 What we provide:
We offer single crystalline AlN on Sapphire Substrate  on c-plane sapphire template,which is also called AlN wafer or AlN template,for UV LEDs, semiconductor devices and AlGaN epitaxial growth.Our epi-ready, C-plane AlN on Sapphire Substrate have good XRD FWHM or dislocation density. The available thickness is from 30nm to 5um.Our single crystal Aluminum Nitride substrates with low dislocation has widely application:including UV LED,detectors, IR seekers windows, epitaxial growth of III-nitrides,Laser, RF transistors and other semiconductor device.
 
Specification of AlN on Sapphire Substrate
2”AlN Epitaxy on Sapphire Templates
Item
PAM-AlNT-SI
Conduction Type
semi-insulating
Diameter
Ф 50.8mm ± 1mm
Thickness:
(30nm-5um)+/- 10%
Substrate:
 sapphire
Orientation :
C-axis(0001)+/-1O
Orientation Flat
A-plane
XRD FWHM of (0002)
<200 arcsec.
Useable Surface Area
≥90%
 Polishing:
Single side Polished,epi-ready
 
 
Properties of AlN on Sapphire Substrate
PROPERTY / MATERIAL
Cubic (Beta) AlN
Hexagonal (Alpha) AlN
.
.
.
Structure
Zinc Blende
Wurzite
Space Group
F bar4 3m
C46v ( = P63mc)
Stability
Meta-stable
Stable
Lattice Parameter(s) at 300K
0.436 nm
a0=0.3111 nm
c0 = 0.4978 nm
Density at 300K
3.285 g.cm-3
3.255 g.cm-3
Elastic Moduli at 300 K
. . .
. . .
Linear Therm. Expansion Coeff.
. . .
Along a0: 5.3x10-6 K-1
at 300 K
Along c0: 4.2x10-6 K-1
Calculated Spontaneous Polarisations
Not Applicable
– 0.081 C m-2 
Bernardini et al 1997
Bernardini & Fiorentini 1999 
Calculated Piezo-electric Coefficients
Not Applicable
e33 = + 1.46 C m-2
e31 = – 0.60 C m-2 
Bernardini et al 1997
Bernardini & Fiorentini 1999
Phonon Energies
. . .
. . .
 
. . .
Units: Wcm-1K-1
 
 .
 
 .
Thermal Conductivity
Tansley et al 1997b 
near 300K
 .
 
3.0 to 3.3
 
for thick, free-standing AlN 
 
Florescu et al, 2001 
Melting Point
. . .
. . .. K
Dielectric Constant
. . .
Mean = 9.14
at Lowish Frequency
Refractive Index
. . .
2.15±0.05 at 3eV 
Tansley et al 1997b 
Nature of Energy Gap Eg
Direct
Direct
Energy Gap Eg at 300 K
. . . eV
6.2 eV 
Yoshida et al 198
Vurgaftman et al (2001)
Energy Gap Eg at 5 K
. . .
6.28 eV 
Vurgaftman et al (2001)
Intrinsic Carrier Conc. at 300 K
. . .
. . .
Ionisation Energy of . . . Donor
. . . .
. . .
Electron Mobility at 300 K
. . .
. . .
for n= . .
Electron Mobility at 77 K
. . . .
. . .
for n= . .
Ionisation Energy of . . . Acceptor
. . .
. . .
Hole Mobility at 300 K
. . . .
. . . .
for p= . .
Hole Mobility at 77 K
. . . .
. . .
for p=. . .
Cubic (Beta) AlN 
Hexagonal (Alpha) AlN 

 

 

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